CVD Diamond Equipment

DT 1800 - DiamoTek 1800

  • Fully Integrated System
  • Embedded PC Control
  • Auto Profiles
  • Integrated Safeties
  • Microwave: 915MHz -- 5 to 30KW
  • Proprietary Reactor Chamber
  • Internally tuned
  • Optimized plasma control
  • Integrated Vacuum System
  • High Vacuum Integrity
  • Turbo pump option
  • Process Gases
  • 5 gas channels standard
  • Options up to 8 channels
  • Stage dimensions
  • 50 to 230 mm
  • Adjustable height, in-situ
  • Water cooled standard
  • Heated stage option
  • Clean Room Compatible Design
  • Typical Growth Diameter: 100-200 mm (Process dependent)
  • Typical Process Pressure: 20-220 torr
  • Deposition Rates: Process dependent